| Academic Year |
2026Year |
School/Graduate School |
Graduate School of Advanced Science and Engineering (Master's Course) |
| Lecture Code |
WRA11801 |
Subject Classification |
Specialized Education |
| Subject Name |
CMOSプロセス実習 |
Subject Name
（Katakana） |
シーモスプロセスジッシュウ |
Subject Name in
English |
CMOS Process Training |
| Instructor |
HIGASHI SEIICHIROU |
Instructor
(Katakana) |
ヒガシ セイイチロウ |
| Campus |
Higashi-Hiroshima |
Semester/Term |
1st-Year, Second Semester, Second Semester |
| Days, Periods, and Classrooms |
(2nd) Inte |
| Lesson Style |
Practical |
Lesson Style
(More Details) |
Online (on-demand) |
| This plactical session will be conducted online (on-demand) using VR equipment. |
| Credits |
1.0 |
Class Hours/Week |
|
Language of Instruction |
J
:
Japanese |
| Course Level |
5
:
Graduate Basic
|
| Course Area（Area） |
25
:
Science and Technology |
| Course Area（Discipline） |
12
:
Electronics |
| Eligible Students |
Master's Course |
| Keywords |
Semiconductor, CMOS Process, VR Training |
| Special Subject for Teacher Education |
|
Special Subject |
|
Class Status
within Educational
Program
(Applicable only to targeted subjects for undergraduate students) | |
|---|
Criterion referenced
Evaluation
(Applicable only to targeted subjects for undergraduate students) | |
|---|
Class Objectives
/Class Outline |
Semiconductors, which underpin modern society, are manufactured in special environments called clean rooms where dust is reduced to the absolute minimum. This is to minimize defects when massively integrating extremely fine transistors. The goal is to understand the manufacturing process of CMOS transistors, which form the basis of cutting-edge technology. Specifically, we will learn what physical phenomena are utilized in each process and what steps are performed for what purposes. Please attend all eight lectures. |
| Class Schedule |
lesson1
lesson2
lesson3
lesson4
lesson5
lesson6
lesson7
lesson8
lesson9
lesson10
lesson11
lesson12
lesson13
lesson14
lesson15
This practical training is provided as VR content to enable students to learn the CMOS transistor fabrication process conducted in the Hiroshima University Institute of Industrial Science cleanroom, regardless of access restrictions to this specialized environment, and even for students located remotely. Through this, students will learn the following key processes:
・Cleanroom construction and dust prevention measures
・Wafer cleaning process
・Photolithography process
・Oxidation and diffusion processes
・Ion implantation process
・Film deposition and etching processes
etc. |
Text/Reference
Books,etc. |
Handout |
PC or AV used in
Class,etc. |
Visual Materials, Other (see [More Details]), moodle |
| (More Details) |
This class will conduct practical training using VR content. |
| Learning techniques to be incorporated |
Post-class Report |
Suggestions on
Preparation and
Review |
We will learn, step by step, the processes involved in completing a semiconductor device.
Please understand the technologies used in each process and develop a clear understanding of how the device structure is formed. |
| Requirements |
|
| Grading Method |
Reports, exams, etc. |
| Practical Experience |
|
| Summary of Practical Experience and Class Contents based on it |
|
| Message |
By learning step by step the process of fabricating CMOS transistors in cutting-edge semiconductor technology, you can discover the fascinating ways in which various physical phenomena are skillfully utilized. |
| Other |
|
Please fill in the class improvement questionnaire which is carried out on all classes.
Instructors will reflect on your feedback and utilize the information for improving their teaching. |