| Academic Year |
2026Year |
School/Graduate School |
School of Engineering |
| Lecture Code |
K6223020 |
Subject Classification |
Specialized Education |
| Subject Name |
半導体プロセス工学 |
Subject Name
（Katakana） |
ハンドウタイプロセスコウガク |
Subject Name in
English |
Semiconductor Process Engineering |
| Instructor |
TERAMOTO AKINOBU |
Instructor
(Katakana) |
テラモト アキノブ |
| Campus |
Higashi-Hiroshima |
Semester/Term |
3rd-Year, Second Semester, 3Term |
| Days, Periods, and Classrooms |
(3T) Mon7-10：ENG 115 |
| Lesson Style |
Lecture |
Lesson Style
(More Details) |
Face-to-face |
| |
| Credits |
2.0 |
Class Hours/Week |
4 |
Language of Instruction |
B
:
Japanese／English |
| Course Level |
4
:
Undergraduate Advanced
|
| Course Area（Area） |
25
:
Science and Technology |
| Course Area（Discipline） |
12
:
Electronics |
| Eligible Students |
B3 |
| Keywords |
p-n junction, MOS device, integration, manufacturing process |
| Special Subject for Teacher Education |
|
Special Subject |
|
Class Status
within Educational
Program
(Applicable only to targeted subjects for undergraduate students) | Electronic Systems Program
(Abilities and Skills)
・Ability to apply fundamental concepts, knowledge, and methodologies in the field of electronic systems to specific and specialized problems |
|---|
Criterion referenced
Evaluation
(Applicable only to targeted subjects for undergraduate students) | Program of Electronic Devices and Systems
（Abilities and Skills）
・Ability to apply basic concepts, knowledge, and methods of electronics engineering to concrete/technical problems. |
|---|
Class Objectives
/Class Outline |
Electronic Systems Program
(Abilities and Skills)
・Ability to apply fundamental concepts, knowledge, and methodologies in the field of electronic systems to specific and specialized problems |
| Class Schedule |
lesson1 Review of Semiconductor Fundamentals
lesson2 Review of Semiconductor Fundamentals
lesson3 Review of Semiconductor Fundamentals
lesson4 p-n Junction
lesson5 p-n Junction
lesson6 Characteristics of MOS Structure
lesson7 Characteristics of MOS Diode
lesson8 MOS Transistor
lesson9 MOS Transistor/
lesson10 Report Assignments for previous lecture
lesson11 Overview of Integrated Circuit Manufacturing Processes
lesson12 Lithography & Etching
lesson13 Si Oxidation & Thin Film Formation
lesson14 Inpurity Difusion & Ion Implantation
lesson15 Limits of Miniaturization and the Future of LSIs
Reports: 10-40% , and Final Exam or Final Report: 60-90% |
Text/Reference
Books,etc. |
1. S.M. Sze, et al., "Physics of Semiconductor Devices (4th ed.)," Wiey, 2021.
2. Y. Taur and T.-H. Ning, "Fundamentals of Modern VLSI Technology (3rd Ed.)," Cambridge University Press, 2022.
3. U. Hilleringmann, "Silicon Semiconductor Technology," Springer, 2023. |
PC or AV used in
Class,etc. |
Handouts |
| (More Details) |
|
| Learning techniques to be incorporated |
Quizzes/ Quiz format |
Suggestions on
Preparation and
Review |
You'll likely encounter many terms that are new to semiconductor processes. Please review them thoroughly while writing your report. |
| Requirements |
|
| Grading Method |
Reports: 10-40% , and Final Exam or Final Report: 60-90% |
| Practical Experience |
Experienced
|
| Summary of Practical Experience and Class Contents based on it |
The course content is based on research conducted in semiconductor devices and processes at companies and universities, incorporating that experience. |
| Message |
|
| Other |
|
Please fill in the class improvement questionnaire which is carried out on all classes.
Instructors will reflect on your feedback and utilize the information for improving their teaching. |