WSP05000 LSI systems I

Hiroshima University Syllabus

Japanese

Academic Year 2025Year School/Graduate School Graduate School of Advanced Science and Engineering (Master's Course) Division of Advanced Science and Engineering Quantum Matter Program

Lecture Code WSP05000 Subject Classification Specialized Education

Subject Name 集積電子システム論I

Subject Name
（Katakana）シュウセキデンシシステムロンイチ

Subject Name in
English LSI systems I

Instructor NODA TOSHIHIKO,TAKAHASHI KAZUHIRO

Instructor
(Katakana) ノダ　トシヒコ,タカハシ　カズヒロ

Campus Across Campuses (videoconferencing, etc.) Semester/Term 1st-Year, First Semester, 1Term

Days, Periods, and Classrooms (1T) Mon9-10

Lesson Style Lecture Lesson Style
(More Details) Online (simultaneous interactive)

Credits 1.0 Class Hours/Week 2 Language of Instruction J : Japanese

Course Level 6 : Graduate Advanced

Course Area（Area） 25 : Science and Technology

Course Area（Discipline） 12 : Electronics

Eligible Students 博士課程前期学生

Keywords CMOS, MEMS, Semiconductor, Sensor, Actuator, Integrated Circuit

Special Subject for Teacher Education 　 Special Subject 　

Class Status
within Educational
Program
(Applicable only to targeted subjects for undergraduate students)
Criterion referenced
Evaluation
(Applicable only to targeted subjects for undergraduate students)

Class Objectives
/Class Outline To learn basic knowledge of microfabrication, evaluation, and packaging technologies required for device fabrication using
CMOS/MEMS integrated sensors.
To systematically learn and understand each element of CMOS/MEMS technology and be able to design fabrication
processes that integrate them.

Class Schedule 1. (Noda) Basics of CMOS Array Sensors (Image Sensors)-1
2. (Noda) Basics of CMOS Array Sensors (Image Sensors)-2
3. (Noda) Imaging Characteristics of CMOS Image Sensors
4. (Noda) CMOS Integrated Circuits-1 Structure, CMOS Process Technology-1 Cleaning
5. (Noda) CMOS Integrated Circuits-2 Process Flow and Cross-Sectional Structure, CMOS Process Technology-2 Film
Deposition and Etching
6. (Noda) CMOS Integrated Circuits-3 Mask Pattern, CMOS Process Technology-3 Photolithography
7. (Noda) CMOS Integrated Circuits-4 Design Rules, CMOS Process Technology-4 Impurity Doping
8. (Noda) Summary of CMOS technology & examination
In case of any changes to the course content and evaluation of achievement or the class format, it will be informed via
Google Classroom or KYOMU JOHO SYSTEM.

Examination

Text/Reference
Books,etc. No textbook

PC or AV used in
Class,etc.

(More Details)

Learning techniques to be incorporated

Suggestions on
Preparation and
Review To enhance a learning effect, students are encouraged to refer to reference books to prepare for and review the lecture
for around 90 minutes each.

Requirements This course is part of the Integrated Green-niX College program (a joint program with Institute of Science Tokyo, Toyohashi University of Technology, Nagaoka University of Technology and Meiji University, based on a memorandum of understanding for credit transfer related to semiconductor talent development). Please note that you cannot register for this course unless you have completed the special audit student application procedure at your respective university beforehand.

Grading Method Final grade will be evaluated by examinations(50%) and reports(50%).
Students who attend all classes will be evaluated as follows:
S: Achieved all goals and obtained total points of examinations and reports, 90 or higher (out of 100 points).
A: Achieved 80 % of goals and obtained total points of examinations and reports, 80 or higher (out of 100 points).
B: Achieved 70 % of goals and obtained total points of examinations and reports, 70 or higher (out of 100 points).
C: Achieved 60 % of goals and obtained total points of examinations and reports, 60 or higher (out of 100 points).

Practical Experience

Summary of Practical Experience and Class Contents based on it

Message

Other

Please fill in the class improvement questionnaire which is carried out on all classes.
Instructors will reflect on your feedback and utilize the information for improving their teaching.

Academic Year	2025Year	School/Graduate School	Graduate School of Advanced Science and Engineering (Master's Course) Division of Advanced Science and Engineering Quantum Matter Program
Lecture Code	WSP05000	Subject Classification	Specialized Education
Subject Name	集積電子システム論I
Subject Name （Katakana）	シュウセキデンシシステムロンイチ
Subject Name in English	LSI systems I
Instructor	NODA TOSHIHIKO,TAKAHASHI KAZUHIRO
Instructor (Katakana)	ノダ　トシヒコ,タカハシ　カズヒロ
Campus	Across Campuses (videoconferencing, etc.)	Semester/Term	1st-Year, First Semester, 1Term
Days, Periods, and Classrooms	(1T) Mon9-10
Lesson Style	Lecture	Lesson Style (More Details)	Online (simultaneous interactive)

Credits	1.0	Class Hours/Week	2	Language of Instruction	J : Japanese
Course Level	6 : Graduate Advanced
Course Area（Area）	25 : Science and Technology
Course Area（Discipline）	12 : Electronics
Eligible Students	博士課程前期学生
Keywords	CMOS, MEMS, Semiconductor, Sensor, Actuator, Integrated Circuit
Special Subject for Teacher Education		Special Subject
Class Status within Educational Program (Applicable only to targeted subjects for undergraduate students)
Criterion referenced Evaluation (Applicable only to targeted subjects for undergraduate students)
Class Objectives /Class Outline	To learn basic knowledge of microfabrication, evaluation, and packaging technologies required for device fabrication using CMOS/MEMS integrated sensors. To systematically learn and understand each element of CMOS/MEMS technology and be able to design fabrication processes that integrate them.
Class Schedule	1. (Noda) Basics of CMOS Array Sensors (Image Sensors)-1 2. (Noda) Basics of CMOS Array Sensors (Image Sensors)-2 3. (Noda) Imaging Characteristics of CMOS Image Sensors 4. (Noda) CMOS Integrated Circuits-1 Structure, CMOS Process Technology-1 Cleaning 5. (Noda) CMOS Integrated Circuits-2 Process Flow and Cross-Sectional Structure, CMOS Process Technology-2 Film Deposition and Etching 6. (Noda) CMOS Integrated Circuits-3 Mask Pattern, CMOS Process Technology-3 Photolithography 7. (Noda) CMOS Integrated Circuits-4 Design Rules, CMOS Process Technology-4 Impurity Doping 8. (Noda) Summary of CMOS technology & examination In case of any changes to the course content and evaluation of achievement or the class format, it will be informed via Google Classroom or KYOMU JOHO SYSTEM. Examination
Text/Reference Books,etc.	No textbook
PC or AV used in Class,etc.
(More Details)
Learning techniques to be incorporated
Suggestions on Preparation and Review	To enhance a learning effect, students are encouraged to refer to reference books to prepare for and review the lecture for around 90 minutes each.
Requirements	This course is part of the Integrated Green-niX College program (a joint program with Institute of Science Tokyo, Toyohashi University of Technology, Nagaoka University of Technology and Meiji University, based on a memorandum of understanding for credit transfer related to semiconductor talent development). Please note that you cannot register for this course unless you have completed the special audit student application procedure at your respective university beforehand.
Grading Method	Final grade will be evaluated by examinations(50%) and reports(50%). Students who attend all classes will be evaluated as follows: S: Achieved all goals and obtained total points of examinations and reports, 90 or higher (out of 100 points). A: Achieved 80 % of goals and obtained total points of examinations and reports, 80 or higher (out of 100 points). B: Achieved 70 % of goals and obtained total points of examinations and reports, 70 or higher (out of 100 points). C: Achieved 60 % of goals and obtained total points of examinations and reports, 60 or higher (out of 100 points).
Practical Experience
Summary of Practical Experience and Class Contents based on it
Message
Other
Please fill in the class improvement questionnaire which is carried out on all classes. Instructors will reflect on your feedback and utilize the information for improving their teaching.

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